Bump structure and electronic packaging solder joint structure and fabricating method thereof

ABSTRACT

A bump structure includes a substrate, a pad, an electrode and a protruding electrode. The pad is disposed on the substrate. The electrode is formed by a first metal material and disposed on the pad. The protruding electrode is formed by a second metal material and disposed on the electrode, wherein a cross-sectional area of the protruding electrode is less than a cross-sectional area of the electrode.

CROSS-REFERENCE TO RELATED APPLICATION

This application claims the priority benefit of Taiwan application serial no. 100150088, filed on Dec. 30, 2011. The entirety of the above-mentioned patent application is hereby incorporated by reference herein and made a part of this specification.

BACKGROUND OF THE DISCLOSURE

1. Field of the Disclosure

The disclosure relates to a bump structure and an electronic packaging solder joint structure and a fabricating method thereof. Particularly, the disclosure relates to a bump structure used to form an intermetallic compound, and an electronic packaging solder joint structure having the intermetallic compound and a fabricating method thereof.

2. Description of Related Art

In an electronic packaging process, commonly used solder joints is micro solder joints. The bonding method of the micro solder joints mainly uses an eutectic bonding and is an irreversible chemical reaction. Intermetallic compound (IMC) is formed by an interreaction between a part of the metal and the solder in the solder joint after eutectic bonding.

Because a general micro solder joint has a less content of the IMC therein, the micro solder joint has better flexibility and toughness, which leads to better capability in anti-mechanical stress, though the micro solder joint has a poor capability in anti-electromigration (EM).

In a situation of increasing heating time or temperature on purpose, or after a temperature cycling reliability testing process, the micro solder joint forms a great content of the IMC very fast due to a high temperature, and the solder has be totally transformed to the IMC. The micro solder joint having the great content of the IMC has hardness higher than that of the original micro solder joint, which has higher rigidity and is lack of flexibility, so that the micro solder joint having the great content of the IMC is liable to be damaged in the temperature cycling reliability testing process. However, the micro solder joint has a characteristic of mitigating an electromigration effect by increasing the content of the IMC.

Therefore, an electronic packaging solder joint structure having both of the characteristics of anti-mechanical stress and anti-electromigration effect is required to be developed, so as to improve reliability and performance of the solder joint.

SUMMARY OF THE DISCLOSURE

The disclosure is directed to a bump structure, which is used to form an intermetallic compound with a specific shape.

The disclosure is directed to a method for fabricating an electronic packaging solder joint structure, by which the electronic packaging solder joint structure with better reliability and performance is fabricated.

The disclosure provides a bump structure including a substrate, a pad, an electrode and a protruding electrode. The pad is disposed on the substrate. The electrode is formed by a first metal material and is disposed on the pad. The protruding electrode is formed by a second metal material and is disposed on the electrode, wherein a cross-sectional area of the protruding electrode is less than a cross-sectional area of the electrode.

The disclosure provides an electronic packaging solder joint structure including a first substrate, a second substrate and a solder joint. The first substrate includes at least a first electrode disposed on the first substrate. The second substrate includes at least a second electrode disposed on the second substrate. The solder joint is disposed between the first electrode and the second electrode, and includes an intermetallic compound layer and a conductive material layer. The intermetallic compound layer is a continuous structure, and is directly connected to the first electrode and the second electrode. The conductive material layer is disposed around the intermetallic compound layer and covers the intermetallic compound layer.

The disclosure provides a method for fabricating an electronic packaging solder joint structure, which includes following steps. A first substrate is provided, and at least a first electrode, at least a first protruding electrode and at least a first conductive material have been formed on the first substrate, where the first protruding electrode is formed on the first electrode, and the first conductive material covers the first electrode and the first protruding electrode. A second substrate is provided, and at least a second electrode, at least a second protruding electrode and at least a second conductive material have been formed on the second substrate, where the second protruding electrode is formed on the second electrode, and the second conductive material covers the second electrode and the second protruding electrode. A bonding process is performed on the first substrate and the second substrate to connect the first protruding electrode and the second protruding electrode to form an intermetallic compound layer, where the intermetallic compound layer is a continuous structure, and is directly connected to the first electrode and the second electrode.

In order to make the aforementioned and other features and advantages of the disclosure comprehensible, several exemplary embodiments accompanied with figures are described in detail below.

BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings are included to provide a further understanding of the disclosure, and are incorporated in and constitute a part of this specification. The drawings illustrate embodiments of the disclosure and, together with the description, serve to explain the principles of the disclosure.

FIGS. 1A-1F are cross-sectional views of a fabrication process of an electronic packaging solder joint structure according to an embodiment of the disclosure.

FIGS. 2A-2F are cross-sectional views of a fabrication process of an electronic packaging solder joint structure according to another embodiment of the disclosure.

DETAILED DESCRIPTION OF DISCLOSED EMBODIMENTS

FIGS. 1A-1F are cross-sectional views of a fabrication process of an electronic packaging solder joint structure according to an embodiment of the disclosure.

Referring to FIG. 1A, a substrate 100 a is provided. The substrate 100 a can have a pad 102 a and a passivation layer 104 a formed thereon. The pad 102 a is formed on the substrate 100 a for electrically connecting a metal interconnect (not shown) in internal of the substrate 100 a. The substrate 100 a is, for example, an organic carrier or an inorganic carrier. The organic carrier is, for example, a printed circuit board (PCB). The inorganic carrier is, for example, a silicon chip. A material of the pad 102 a is, for example, aluminium, aluminium silicon, aluminium silicon copper, copper or nickel, etc. The passivation layer 104 a is formed on the substrate 100 a and the pad 102 a, and exposes a part of the pad 102 a. A material of the passivation layer 104 a is, for example, polyimide (PI), polybenzoxazole (PBO), Ajinomoto build-up film (ABF), Si_(x)O_(y), or Si_(x)N_(y), etc. The pad 102 a and the passivation layer 104 a are, for example, respectively formed through a deposition process and a patterning process.

A patterned photoresist layer 106 a is formed on the substrate 100 a, and the patterned photoresist layer 106 a exposes the pad 102 a. In the present embodiment, the patterned photoresist layer 106 a further exposes a part of the passivation layer 104 a. A material of the patterned photoresist layer 106 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 106 a is, for example, formed through a photolithography process.

At least one electrode 108 a is formed on the pad 102 a and the passivation layer 104 a exposed by the patterned photoresist layer 106 a. A material of the electrode 108 a is, for example, Cu, Ag, Ni, Al, Ti, W, Cr, Au, Zn, Bi, In or alloys thereof, etc. A method of forming the electrode 108 a is, for example, electroplating. Although the electrode 108 a is formed through the aforementioned method, the disclosure is not limited thereto.

Referring to FIG. 1B, the patterned photoresist layer 106 a is removed, and a method of removing the patterned photoresist layer 106 a is, for example, a dry-type photoresist removing method.

A patterned photoresist layer 110 a is formed on the substrate 100 a, and the patterned photoresist layer 110 a exposes a part of the electrode 108 a. A material of the patterned photoresist layer 110 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 110 a is, for example, formed through a photolithography process.

Moreover, a metal stacking structure 116 a formed by alternately stacking at least one metal layer 112 a and at least one metal layer 114 a is formed on the electrode 108 a exposed by the patterned photoresist layer 110 a. A material of the metal layer 112 a is, for example, Cu, Ag, Ni, Al, Ti, W, Cr, Au, Zn, Bi, In or alloys thereof, etc., and a material of the metal layer 114 a is, for example, Sn. A method of forming the metal layer 112 a and the metal layer 114 a is, for example, electroplating.

Referring to FIG. 1C, the patterned photoresist layer 110 a is removed. A method of removing the patterned photoresist layer 110 a is, for example, the dry-type photoresist removing method.

A thermal process is performed on the metal stacking structure 116 a, so that the metal layer 112 a and the metal layer 114 a react to form at least one protruding electrode 118 a on the electrode 108 a. A material of the protruding electrode 118 a is, for example, an intermetallic compound, for example, Cu_(x)Sn_(y), Ni_(x)Sn_(y), In_(x)Sn_(y), Zn_(x)Sn_(y) or Au_(x)Sn_(y), etc. The thermal process is, for example, a reflow process or an aging process. A heating temperature of the thermal process is, for example, 150° C.-300° C., and a heating time of the thermal process is, for example, 3 seconds to 60 minutes. Although the protruding electrode 118 a is formed through the aforementioned method, the disclosure is not limited thereto.

A patterned photoresist layer 120 a is formed on the substrate 100 a, where the patterned photoresist layer 120 a exposes the electrode 108 a and the protruding electrode 118 a. A material of the patterned photoresist layer 120 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 120 a is, for example, formed through a photolithography process.

At least one conductive material 122 a is formed to cover the electrode 108 a and the protruding electrode 118 a. A material of the conductive material 122 a is, for example, Sn, SnAg or SnAgCu, etc., and a method of forming the conductive material 122 a is, for example, electroplating.

Referring to FIG. 1D, the patterned photoresist layer 120 a is removed, and a method of removing the patterned photoresist layer 120 a is, for example, the dry-type photoresist removing method.

Now, the electrode 108 a, the protruding electrode 118 a and the conductive material 122 a are formed on the substrate 100 a, where the protruding electrode 118 a is formed on the electrode 108 a, and the conductive material 122 a covers the electrode 108 a and the protruding electrode 118 a. Moreover, the pad 102 a and the passivation layer 104 a are further formed on the substrate 100 a. The pad 102 a is formed on the substrate 100 a. The passivation layer 104 a is formed on the substrate 100 a and the pad 102 a, and exposes a part of the pad 102 a.

Here, a bump structure 123 a is described with reference of FIG. 1D. The bump structure 123 a includes the substrate 100 a, the electrode 108 a and the protruding electrode 118 a. The electrode 108 a is disposed on the substrate 100 a. The protruding electrode 118 a is disposed on the electrode 108 a, where a cross-sectional area of the protruding electrode 118 a is less than a cross-sectional area of the electrode 108 a. A width of the protruding electrode 118 a is, for example, smaller than a width of the electrode 108 a. Moreover, the bump structure 123 a further includes the pad 102 a, the passivation layer 104 a and the conductive material 122 a. The pad 102 a is disposed between the substrate 100 a and the electrode 108 a. The passivation layer 104 a is disposed on the substrate 100 a and the pad 102 a, and exposes a part of the pad 102 a. The conductive material 122 a covers the protruding electrode 118 a and the electrode 108 a. In the present embodiment, since the bump structure 123 a has the protruding electrode 118 a, it avails forming an intermetallic compound. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the bump structure 123 a have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

Referring to FIG. 1E, a substrate 100 b is provided, and an electrode 108 b, a protruding electrode 118 b and a conductive material 122 b have been formed on the substrate 100 b, where the protruding electrode 118 b is formed on the electrode 108 b, and the conductive material 122 b covers the electrode 108 b and the protruding electrode 118 b. The substrate 100 b is, for example, an organic carrier or an inorganic carrier. The organic carrier is, for example, a PCB. The inorganic carrier is, for example, a silicon chip. Moreover, a pad 102 b and a passivation layer 104 b can be further formed on the substrate 100 b. The pad 102 b is formed on the substrate 100 b. The passivation layer 104 b is formed on the substrate 100 b and the pad 102 b, and exposes a part of the pad 102 b. Materials of the electrode 108 b and the electrode 108 a can be the same or different, which is determined by those skilled in the art according to the product design. However, since the materials, configurations and fabricating methods of the electrode 108 b, the protruding electrode 118 b and the conductive material 122 b on the substrate 100 b are the similar to that of the electrode 108 a, the protruding electrode 118 a and the conductive material 122 a on the substrate 100 a, detailed descriptions thereof can refer to the descriptions of FIGS. 1A-1D, which are not repeated herein.

Here, a bump structure 123 b is described with reference of FIG. 1E. The bump structure 123 b includes the substrate 100 b, the electrode 108 b and the protruding electrode 118 b. The electrode 108 b is disposed on the substrate 100 b. The protruding electrode 118 b is disposed on the electrode 108 b, where a cross-sectional area of the protruding electrode 118 b is less than a cross-sectional area of the electrode 108 b. A width of the protruding electrode 118 b is, for example, smaller than a width of the electrode 108 b. Moreover, the bump structure 123 b further includes the pad 102 b, the passivation layer 104 b and the conductive material 122 b. The pad 102 b is disposed between the substrate 100 b and the electrode 108 b. The passivation layer 104 b is disposed on the substrate 100 b and the pad 102 b, and exposes a part of the pad 102 b. The conductive material 122 b covers the protruding electrode 118 b and the electrode 108 b. In the present embodiment, since the bump structure 123 b has the protruding electrode 118 b, it avails forming the intermetallic compound. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the bump structure 123 b have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

Moreover, referring to FIG. 1F, a bonding process is performed on the substrate 100 a and the substrate 100 b, so that the protruding electrode 118 a and the protruding electrode 118 b are connected to form an intermetallic compound layer 124. The intermetallic compound layer 124 is a continuous structure, and is directly connected to the electrode 108 a and the electrode 108 b. Moreover, in the bonding process, the conductive material 122 a and the conductive material 122 b are connected to form a conductive material layer 126, and the intermetallic compound layer 124 and the conductive material layer 126 form a solder joint 128. A heating temperature of the bonding process is, for example, 150° C.-300° C., and a heating time of the bonding process is, for example, 3 seconds to 60 minutes. Moreover, in the bonding process, when the protruding electrode 118 a and the protruding electrode 118 b again react with the conductive material 122 a and the conductive material 122 b, a width of the intermetallic compound layer 124 is greater than the width of the protruding electrode 118 a and the width of the protruding electrode 118 b.

The intermetallic compound layer 124 is, for example, a column-like structure, and a material of the intermetallic compound layer 124 is, for example, Cu_(x)Sn_(y), Ni_(x)Sn_(y), In_(x)Sn_(y), Zn_(x)Sn_(y) or Au_(x)Sn_(y), etc.

The intermetallic compound layer 124, for example, forms an electrical channel with the electrode 108 a and the electrode 108 b through a chemical bonding method.

The conductive material layer 126 is disposed around the intermetallic compound layer 124, and is connected to the intermetallic compound layer 124. Moreover, the conductive material layer 126 is, for example, connected to the electrode 108 a and the electrode 108 b. A material of the conductive material layer 126 is, for example, Sn, SnAg or SnAgCu, etc. A resistance coefficient of the intermetallic compound layer 124 is, for example, smaller than a resistance coefficient of the conductive material layer 126, so that when electrons flow through the solder joint 128, the electrodes flow towards the intermetallic compound layer 124 as far as possible, which may further improve the capability of anti-electromigration.

In the embodiment, although the intermetallic compound layer 124 having a column-like shape is taken as an example for descriptions, the disclosure is not limited thereto. In other embodiments, by selecting the materials of the electrode 108 a and the electrode 108 b, the electrode 108 a and the electrode 108 b can respectively react with the conductive material 122 a and the conductive material 122 b, and the intermetallic compound layer 124 can form an I-shape structure (similar to an intermetallic compound layer 128 of FIG. 2F). When the intermetallic compound layer 124 has the I-shape structure, the electrodes are forced to flow through the intermetallic compound layer 124, so as to further improve the capability of anti-electromigration.

According to the above embodiment, it is known that since the intermetallic compound layer 124 in the solder joint 128 is a continuous structure and is directly connected to the electrode 108 a and the electrode 108 b, and the conductive material layer 126 is disposed around the intermetallic compound layer 124, the electronic packaging solder joint structure may have both characteristics of anti-mechanical stress and anti-electromigration, so as to achieve better reliability and performance. Moreover, the method for fabricating the electronic packaging solder joint structure disclosed by the disclosure can be easily integrated with the existing processes.

FIGS. 2A-2F are cross-sectional views of a fabrication process of an electronic packaging solder joint structure according to another embodiment of the disclosure.

Referring to FIG. 2A, a substrate 200 a is provided. The substrate 200 a can have a pad 202 a and a passivation layer 204 a formed thereon. The pad 202 a is formed on the substrate 200 a for electrically connecting a metal interconnect (not shown) in internal of the substrate 200 a. The substrate 200 a is, for example, an organic carrier or an inorganic carrier. The organic carrier is, for example, a printed circuit board (PCB). The inorganic carrier is, for example, a silicon chip. A material of the pad 202 a is, for example, aluminium, aluminium silicon, aluminium silicon copper, copper or nickel, etc. The passivation layer 204 a is formed on the substrate 200 a and the pad 202 a, and exposes a part of the pad 202 a. A material of the passivation layer 204 a is, for example, polyimide (PI), polybenzoxazole (PBO), Ajinomoto build-up film (ABF), Si_(x)O_(y), or Si_(x)N_(y), etc. The pad 202 a and the passivation layer 204 a are, for example, respectively formed through a deposition process and a patterning process.

A patterned photoresist layer 206 a is formed on the substrate 200 a, and the patterned photoresist layer 206 a exposes the pad 202 a. In the present embodiment, the patterned photoresist layer 206 a further exposes a part of the passivation layer 204 a. A material of the patterned photoresist layer 206 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 206 a is, for example, formed through a photolithography process.

At least one electrode 208 a is formed on the pad 202 a and the passivation layer 204 a exposed by the patterned photoresist layer 206 a. A material of the electrode 208 a is, for example, Cu, Ag, Ni, Al, Ti, W, Cr, Au, Zn, Bi, In or alloys thereof, etc. A method of forming the electrode 208 a is, for example, electroplating. Although the electrode 208 a is formed through the aforementioned method, the disclosure is not limited thereto.

Referring to FIG. 2B, the patterned photoresist layer 206 a is removed, and a method of removing the patterned photoresist layer 206 a is, for example, the dry-type photoresist removing method.

A patterned photoresist layer 210 a is formed on the substrate 200 a, and the patterned photoresist layer 210 a exposes a part of the electrode 208 a. A material of the patterned photoresist layer 210 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 210 a is, for example, formed through the photolithography process.

Moreover, a protruding electrode 212 a is formed on the electrode 208 a exposed by the patterned photoresist layer 210 a. A material of the protruding electrode 212 a is, for example, Cu, Ag, Ni, Al, Ti, W, Cr, Au, Zn, Bi, In or alloys thereof, etc. The materials of the protruding electrode 212 a and the electrode 208 a can be the same or different. A method of forming the protruding electrode 212 a is, for example, electroplating. Although the electrode 212 a is formed through the aforementioned method, the disclosure is not limited thereto.

Referring to FIG. 2C, the patterned photoresist layer 210 a is removed. A method of removing the patterned photoresist layer 210 a is, for example, the dry-type photoresist removing method.

A patterned photoresist layer 214 a is formed on the substrate 200 a, and the patterned photoresist layer 214 a exposes the electrode 208 a and the protruding electrode 212 a. A material of the patterned photoresist layer 214 a is, for example, positive photoresist or negative photoresist. The patterned photoresist layer 214 a is, for example, formed through a photolithography process.

At least one conductive material 216 a is formed to cover the electrode 208 a and the protruding electrode 212 a. A material of the conductive material 216 a is, for example, Sn, SnAg or SnAgCu, etc., and a method of forming the conductive material 216 a is, for example, electroplating.

Referring to FIG. 2D, the patterned photoresist layer 214 a is removed, and a method of removing the patterned photoresist layer 214 a is, for example, the dry-type photoresist removing method.

Now, the electrode 208 a, the protruding electrode 212 a and the conductive material 216 a are formed on the substrate 200 a, where the protruding electrode 212 a is formed on the electrode 208 a, and the conductive material 216 a covers the electrode 208 a and the protruding electrode 212 a. Moreover, the pad 202 a and the passivation layer 204 a are further formed on the substrate 200 a. The pad 202 a is formed on the substrate 200 a. The passivation layer 204 a is formed on the substrate 200 a and the pad 202 a, and exposes a part of the pad 202 a.

Here, a bump structure 217 a is described with reference of FIG. 2D. The bump structure 217 a includes the substrate 200 a, the electrode 208 a and the protruding electrode 212 a. The electrode 208 a is disposed on the substrate 200 a. The protruding electrode 212 a is disposed on the electrode 208 a, where a cross-sectional area of the protruding electrode 212 a is less than a cross-sectional area of the electrode 208 a. A width of the protruding electrode 212 a is, for example, smaller than a width of the electrode 208 a. Moreover, the bump structure 217 a further includes the pad 202 a, the passivation layer 204 a and the conductive material 216 a. The pad 202 a is disposed between the substrate 200 a and the electrode 208 a. The passivation layer 204 a is disposed on the substrate 200 a and the pad 202 a, and exposes a part of the pad 202 a. The conductive material 216 a covers the protruding electrode 212 a and the electrode 208 a. In the present embodiment, since the bump structure 217 a has the protruding electrode 212 a, it avails forming an intermetallic compound. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the bump structure 217 a have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

Referring to FIG. 2E, a substrate 200 b is provided, and an electrode 208 b, a protruding electrode 212 b and a conductive material 216 b have been formed on the substrate 200 b, where the protruding electrode 212 b is formed on the electrode 208 b, and the conductive material 216 b covers the electrode 208 b and the protruding electrode 212 b. The substrate 200 b is, for example, an organic carrier or an inorganic carrier. The organic carrier is, for example, a PCB. The inorganic carrier is, for example, a silicon chip. Moreover, a pad 202 b and a passivation layer 204 b can be further formed on the substrate 200 b. The pad 202 b is formed on the substrate 200 b. The passivation layer 204 b is formed on the substrate 200 b and the pad 202 b, and exposes a part of the pad 202 b. Materials of the electrode 208 b and the electrode 208 a can be the same or different, which is determined by those skilled in the art according to the product design. However, since the materials, configurations and fabricating methods of the electrode 208 b, the protruding electrode 212 b and the conductive material 216 b on the substrate 200 b are the similar to that of the electrode 208 a, the protruding electrode 212 a and the conductive material 216 a on the substrate 200 a, detailed descriptions thereof can refer to the descriptions of FIGS. 2A-2D, which are not repeated herein.

Here, a bump structure 217 b is described with reference of FIG. 2E. The bump structure 217 b includes the substrate 200 b, the electrode 208 b and the protruding electrode 212 b. The electrode 208 b is disposed on the substrate 200 b. The protruding electrode 212 b is disposed on the electrode 208 b, where a cross-sectional area of the protruding electrode 212 b is less than a cross-sectional area of the electrode 208 b. A width of the protruding electrode 212 b is, for example, smaller than a width of the electrode 208 b. Moreover, the bump structure 217 b further includes the pad 202 b, the passivation layer 204 b and the conductive material 216 b. The pad 202 b is disposed between the substrate 200 b and the electrode 208 b. The passivation layer 204 b is disposed on the substrate 200 b and the pad 202 b, and exposes a part of the pad 202 b. The conductive material 216 b covers the protruding electrode 212 b and the electrode 208 b. In the present embodiment, since the bump structure 217 b has the protruding electrode 212 b, it avails forming the intermetallic compound. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the bump structure 217 b have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

Moreover, referring to FIG. 2F, a bonding process is performed on the substrate 200 a and the substrate 200 b, so that the protruding electrode 212 a and the protruding electrode 212 b are connected, and the protruding electrode 212 a reacts with the conductive material 216 a and the protruding electrode 212 b reacts with the conductive material 216 b to form a first portion 218 a of an intermetallic compound layer 218. The electrode 208 a reacts with the conductive material 216 a to form a second portion 218 b of the intermetallic compound layer 218, and the electrode 208 b reacts with the conductive material 216 b to form a third portion 218 c of the intermetallic compound layer 218. The intermetallic compound layer 218 is a continuous structure, and is directly connected to the electrode 208 a and the electrode 208 b. Moreover, a width of the first portion 218 a of the intermetallic compound layer 218 is, for example, greater than a width of the protruding electrode 212 a and a width of the protruding electrode 212 b. Moreover, in the bonding process, the conductive material 216 a and the conductive material 216 b are connected to form a conductive material layer 220, and the intermetallic compound layer 218 and the conductive material layer 220 form a solder joint 222. A heating temperature of the bonding process is, for example, 150° C.-300° C., and a heating time of the bonding process is, for example, 3 seconds to 60 minutes.

In the embodiment, the intermetallic compound layer 218 is, for example, an I-shape structure, and a material of the intermetallic compound layer 218 is, for example, Cu_(x)Sn_(y), Ni_(x)Sn_(y), In_(x)Sn_(y), Zn_(x)Sn_(y) or Au_(x)Sn_(y), etc.

The intermetallic compound layer 218, for example, forms an electrical channel with the electrode 208 a and the electrode 208 b through a chemical bonding method. Moreover, since the materials of the protruding electrode 212 a and the electrode 208 a can be the same or different, and the materials of the protruding electrode 212 b and the electrode 208 b can be the same or different, materials of the first portion 218 a, the second portion 218 b and the third portion 218 c can be the same or different, which can be determined by those skilled in the art according to the product design.

The conductive material layer 220 is disposed around the intermetallic compound layer 218, and is connected to the intermetallic compound layer 218. Moreover, the conductive material layer 220 is, for example, isolated to the electrode 208 a and the electrode 208 b through the intermetallic compound layer 218. A material of the conductive material layer 220 is, for example, Sn, SnAg or SnAgCu, etc. A resistance coefficient of the intermetallic compound layer 218 is, for example, smaller than a resistance coefficient of the conductive material layer 220, so that when electrons flow through the solder joint 222, the electrodes flow towards the intermetallic compound layer 218 as far as possible, which may further improve the capability of anti-electromigration.

In the embodiment, although the intermetallic compound layer 218 having the I-shape is taken as an example for descriptions, the disclosure is not limited thereto. In other embodiments, by selecting the materials of the electrode 208 a and the electrode 208 b, the electrode 208 a and the electrode 208 b do not react with the conductive material 216 a and the conductive material 216 b, and the intermetallic compound layer 218 only has the first portion 218 a formed through reaction between the protruding electrode 212 a and the conductive material 216 a and reaction between the protruding electrode 212 b and the conductive material 216 b to form a column-like structure (similar to the intermetallic compound layer 124 of FIG. 1F).

Similarly, since the intermetallic compound layer 218 in the solder joint 222 is a continuous structure and is directly connected to the electrode 208 a and the electrode 208 b, and the conductive material layer 220 is disposed around the intermetallic compound layer 218, the electronic packaging solder joint structure may better reliability and performance. Moreover, when the intermetallic compound layer 218 has the I-shape structure, the electrodes are forced to flow through the intermetallic compound layer 218, so as to further improve the capability of anti-electromigration. Moreover, the method for fabricating the electronic packaging solder joint structure disclosed by the disclosure can be easily integrated with the existing processes.

The electronic packaging solder joint structures provided by the aforementioned embodiments are described below with reference of FIG. 1F and FIG. 2F.

Referring to FIG. 1F, the electronic packaging solder joint structure includes the substrate 100 a, the substrate 100 b and the solder joint 128. The substrate 100 a has at least one electrode 108 a thereon. The substrate 100 b has at least one electrode 108 b thereon. The solder joint 128 is disposed between the electrode 108 a and the electrode 108 b, and includes the intermetallic compound layer 124 and the conductive material layer 126. The intermetallic compound layer 124 is a continuous structure and is directly connected to the electrode 108 a and the electrode 108 b. The conductive material layer 126 is disposed around the intermetallic compound layer 124 and is connected to the intermetallic compound layer 124. The intermetallic compound layer 124 is, for example, a column-like structure. Moreover, the electronic packaging solder joint structure further includes the pad 102 a, the passivation layer 104 a, the pad 102 b and the passivation layer 104 b. The pad 102 a is disposed on the substrate 100 a. The passivation layer 104 a is disposed on the substrate 100 a and the pad 102 a, and exposes a part of the pad 102 a. The pad 102 b is disposed on the substrate 100 b. The passivation layer 104 b is disposed on the substrate 100 b and the pad 102 b, and exposes a part of the pad 102 b. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the electronic packaging solder joint structure have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

According to the above embodiment, it is known that in the electronic packaging solder joint structure, since the intermetallic compound layer 124 in the solder joint 128 is a continuous structure and is directly connected to the electrode 108 a and the electrode 108 b, and the conductive material layer 126 is disposed around the intermetallic compound layer 124, the electronic packaging solder joint structure may have both characteristics of anti-mechanical stress and anti-electromigration, so as to achieve better reliability and performance.

Referring to FIG. 1F and FIG. 2F, a difference between the electronic packaging solder joint structure of FIG. 2F and the electronic packaging solder joint structure of FIG. 1F is that in the electronic packaging solder joint structure of FIG. 2F, the intermetallic compound layer 218 is the I-shape structure, which is different to the intermetallic compound layer 124 of FIG. 1F that has a column-like structure. The intermetallic compound layer 218 includes the first portion 218 a, the second portion 218 b and the third portion 218 c. The first portion 218 a is connected to the electrode 208 a and the electrode 208 b. The second portion 218 b is disposed around the first portion 218 a and is connected to the electrode 208 a and the first portion 218 a. The third portion 218 c is disposed around the first portion 218 a, and is connected to the electrode 208 b and the first portion 218 a. Moreover, the material, characteristic, configuration, fabricating method and effect of each component in the electronic packaging solder joint structure of FIG. 2F have been described in detail in the aforementioned embodiment, so that details thereof are not repeated.

Similarly, in the electronic packaging solder joint structure, since the intermetallic compound layer 218 in the solder joint 222 is a continuous structure and is directly connected to the electrode 208 a and the electrode 208 b, and the conductive material layer 220 is disposed around the intermetallic compound layer 218, the electronic packaging solder joint structure may have both characteristics of anti-mechanical stress and anti-electromigration, so as to achieve better reliability and performance. Moreover, when the intermetallic compound layer 218 has the I-shape structure, the electrodes are forced to flow through the intermetallic compound layer 218, so as to further improve the capability of anti-electromigration.

In sum, the aforementioned embodiments at least has following characteristics:

-   -   1. The bump structure provided by the aforementioned embodiments         avails forming the intermetallic compound.     -   2. The electronic packaging solder joint structure provided by         the aforementioned embodiments has both characteristics of         anti-mechanical stress and anti-electromigration.     -   3. The method for fabricating the electronic packaging solder         joint structure of the aforementioned embodiment can be         integrated with the existing processes to fabricate the         electronic packaging solder joint structure having better         reliability and performance.

It will be apparent to those skilled in the art that various modifications and variations can be made to the structure of the disclosure without departing from the scope or spirit of the disclosure. In view of the foregoing, it is intended that the disclosure cover modifications and variations of this disclosure provided they fall within the scope of the following claims and their equivalents. 

What is claimed is:
 1. An electronic packaging solder joint structure, comprising: a first substrate, comprising: a first pad disposed on the first substrate; and at least a first electrode, disposed on the first pad; a second substrate, comprising: a second pad disposed on the second substrate; and at least a second electrode, disposed on the second pad; and a solder joint, disposed between the first electrode and the second electrode, and comprising: an intermetallic compound layer, being a continuous structure, and directly connected to the first electrode and the second electrode; and a conductive material layer, disposed around the intermetallic compound layer, and covering the intermetallic compound layer, wherein the conductive material layer and the first electrode being physically isolated with the intermetallic compound layer, and wherein the conductive material layer and the second electrode being physically isolated with the intermetallic compound layer.
 2. The electronic packaging solder joint structure as claimed in claim 1, wherein the intermetallic compound layer comprises: a first portion, disposed on the first electrode; a second portion, disposed on the second electrode; and a third portion, connected to the first portion and the second portion, wherein a diameter of the third portion is smaller than a width of the first portion, and wherein the diameter of the third portion is smaller than a width of the second portion disposed around the first portion, and connected to the second electrode and the first portion.
 3. The electronic packaging solder joint structure as claimed in claim 1, wherein a material of the intermetallic compound layer comprises Cu_(x)Sn_(y), Ni_(x)Sn_(y), In_(x)Sn_(y), Zn_(x)Sn_(y) or Au_(x)Sn_(y).
 4. The electronic packaging solder joint structure as claimed in claim 1, wherein a material of the first electrode and the second electrode comprises Cu, Ag, Ni, Al, Ti, W, Cr, Au, Zn, Bi, In or alloys thereof.
 5. The electronic packaging solder joint structure as claimed in claim 1, wherein a material of the conductive material layer comprises Sn, SnAg or SnAgCu.
 6. The electronic packaging solder joint structure as claimed in claim 1, wherein a resistance coefficient of the intermetallic compound layer is smaller than a resistance coefficient of the conductive material layer. 